Getting substrates clean is the essential starting point for fabrication of organic devices. Hellmanex III has been designed to provide exceptional cleaning of glass and quartz substrates, without damaging them or leaving a residue behind. Typically, we use 2 ml of Hellmanex III in 200 ml of hot water; and sonicate for 5 minutes before dump rinsing in water. As such, 100 ml of Hellmanex will provide cleaning for up to 50 racks of substrates.

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